工業顯微鏡廣泛應用于半導體,電子工業進行晶體,集成電路的檢驗和科學研究.
配備有反射照明,成象和觀察系統,偏光裝置.
Industrial microscope is widely used for crystal, integrated circuit (IC) examination
and research. It is supplied with reflected illumination, imaging and viewing system,
polarized imaging system.
規格 Specifications
◇ 無限遠光學系統,管鏡焦距200mm
Infinitive Optical System, Tube Lens Focal Length 200mm
◇ 鉸鏈式三目鏡筒,30°傾斜, 瞳距55-75mm
Compensation Free Trinocular Tube, Inclined at 30°, Interpupillary Distance 55-75mm
◇ 高眼點,大視場目鏡WF10X/22
High Point and Wide Field Eyepiece WF10/22
◇ 長工作距離,平場復消色差物鏡2X/0.055, 5X/0.14, 10X/0.28, 20X/0.29, 50X/0.42
Long Working Distance, Plan Apo Objectives 2X/0.055, 5X/0.14, 10X/0.28, 20X/0.29, 50X/0.42
◇ 五孔物鏡轉換器
Quintuple Nosepiece
◇ 6″雙層活動平臺和圓平臺
6″Double Layers Mechanical Stage and circle stage
◇ 同軸粗微調焦機構,微動格值0.002mm
Coaxial Coarse & Fin Focus Adjustment System, Fine Division 0.002mm
◇照明系統 Illumination System
冷光源光纖反射照明器:12V150W
Cold Light Fiber Reflected Illnminator: 12V150W
